High energy pulse suppression method

ABSTRACT

A laser processes a workpiece with laser pulses delivered at random time intervals and at substantially constant energy levels by characterizing the laser cavity discharge behavior and utilizing that information for adjusting dummy pulse time periods to compensate for the energy errors. Dummy pulses are laser pulses that are blocked from reaching a workpiece. A second way for providing constant pulse energies employs an AOM for varying amounts of laser energy passed to the workpiece. A third way of providing constant pulse energies entails extending the pulse period of selected pulses to allow additional laser cavity charging time whenever a dummy pulse is initiated.

RELATED APPLICATION

This application is a divisional of U.S. patent application Ser. No.10/997,586, filed Nov. 24, 2004 (now U.S. Pat. No. 7,616,669, issuedNov. 10, 2009), for HIGH ENERGY PULSE SUPPRESSION METHOD, which is acontinuation-in-part of U.S. patent application Ser. No. 10/611,798,filed Jun. 30, 2003, for LASER PULSE PICKING EMPLOYING CONTROLLED AOMLOADING.

TECHNICAL FIELD

This invention relates to lasers and, more particularly, to a method andan apparatus for providing high repetition rate, stable energy laserpulses on demand with a load controlled acousto-optic modulator (“AOM”)to minimize distortion of the quality or positional accuracy of thelaser beam.

BACKGROUND OF THE INVENTION

Lasers are widely employed in a variety of R & D operations includingspectroscopic and biotech study and industrial operations includinginspecting, processing, and micromachining a variety of electronicmaterials and substrates. For example, to repair a dynamic random accessmemory (“DRAM”), laser pulses are used to sever electrically conductivelinks to disconnect faulty memory cells from a DRAM device, and then toactivate redundant memory cells to replace the faulty memory cells.Because faulty memory cells needing link removals are randomly located,the links that need to be severed are located randomly. Thus, during thelaser link repairing process, the laser pulses are fired at random pulseintervals. In other words, the laser pulses are running at a widevariable range of pulse repetition frequencies (“PRF”s), rather than ata constant PRF. For industrial processes to achieve greater productionthroughput, the laser pulse is fired at the target link without stoppingthe laser beam scanning mechanism. This production technique is referredto in the industry as “on-the-fly” (“OTF”) link processing. Other commonlaser applications employ laser pulses that are fired only when they areneeded at random time moments.

However, the laser energy per pulse typically decreases with increasingPRF while laser pulse width increases with increasing PRF,characteristics that are particularly true for Q-switched, solid-statelasers. While many laser applications require randomly time-displacedlaser pulses on demand, these applications also require that the laserenergy per pulse and the pulse width be kept substantially constant. Forlink processing on memory or other IC chips, inadequate laser energywill result in incomplete link severing, while too much laser energywill cause unacceptable damage to the passivation structure or thesilicon substrate. The acceptable range of laser pulse energies is oftenreferred to as a “process window.” For many practical IC devices, theprocess window requires that laser pulse energy vary by less than 5%from a selected pulse energy value.

Skilled persons have taken various approaches for ensuring operationwithin a process window or for expanding the process window. Forexample, U.S. Pat. No. 5,590,141 for METHOD AND APPARATUS FOR GENERATINGAND EMPLOYING A HIGH DENSITY OF EXCITED IONS IN A LASANT, which isassigned to the assignee of this patent application, describessolid-state lasers having lasants exhibiting a reduced pulse energy dropoff as a function of PRF and, therefore, a higher usable PRF. Suchlasers are, therefore, capable of generating more stable pulse energylevels when operated below their maximum PRF. U.S. Pat. No. 5,265,114for SYSTEM AND METHOD FOR SELECTIVELY LASER PROCESSING A TARGETSTRUCTURE OF ONE OR MORE MATERIALS OF A MULTIMATERIAL, MULTILAYERDEVICE, which is also assigned to the assignee of this patentapplication, describes using a longer laser wavelength such as 1,320nanometers (“nm”) to expand the link process window to permit a widervariation of the laser pulse energy during the process. U.S. Pat. No.5,226,051 for LASER PUMP CONTROL FOR OUTPUT POWER STABILIZATIONdescribes a technique of equalizing the laser pulse energy bycontrolling the current of the pumping diodes. The technique works wellin practical applications employing a laser PRF below about 25 KHz or 30KHz.

The above-described laser processing applications typically employinfrared (“IR”) lasers having wavelengths from 1,047 nm to 1,342 nm,running at a PRF not over about 25 or 30 KHz. However, production needsare demanding much higher throughput, so lasers should be capable ofoperating at PRFs much higher than about 25 KHz, such as 50-60 KHz orhigher. In addition, many laser processing applications are improved byemploying ultraviolet (“UV”) energy wavelengths, which are typicallyless than about 400 nm. Such UV wavelengths may be generated bysubjecting an IR laser to a harmonic generation process that stimulatesthe second, third, or fourth harmonics of the IR laser. Unfortunately,due to the nature of the harmonic generation, the pulse-to-pulse energylevels of such UV lasers are particularly sensitive to time variationsin PRF and laser pulse interval.

U.S. Pat. No. 6,172,325 for LASER PROCESSING POWER OUTPUT STABILIZATIONAPPARATUS AND METHOD EMPLOYING PROCESSING POSITION FEEDBACK, which isalso assigned to the assignee of this patent application, describes atechnique of operating the laser at a constant high repetition rate inconjunction with a position feedback-controlled laser pulse picking orgating device to provide laser pulse picking on demand, at random timeinterval that is a multiple of the laser pulse interval, with good laserpulse energy stability and high throughput.

Typical laser pulse picking or gating devices include an acousto-opticmodulator (“AOM”) and an electro-optic modulator (“EOM”), also referredto as a Pockels cell. Typical EOM material such as KD*P or KDP suffersfrom relatively strong absorption at the UV wavelengths, which resultsin a lower damage threshold of the material at the wavelength used andlocal heating of optical devices positioned along the laser beam pathwithin the gating device and thereby causes changes in the voltagerequired by the modulator to effect one-half wavelength retardation.Another disadvantage of the EOM is its questionable ability to performwell at a repetition rate over 50 KHz. AOM material is, on the otherhand, quite transparent to the UV of 250 nm up to the IR of 2,000 nm,which allows the AOM to perform well throughout typical laserwavelengths within the range. An AOM can also easily accommodate thedesirable gating of pulses at a repetition rate of up to a few hundredKHz. One disadvantage of the AOM is its limited diffraction efficiencyof about 75-90%.

FIG. 1 shows a typical prior art AOM 10 driven by a radio frequency(“RF”) driver 12 and employed for a laser pulse picking or gatingapplication, and FIGS. 2A to 2D (collectively, FIG. 2) showcorresponding prior art timing graphs for incoming laser pulses 14, AOMRF pulses 15, and AOM output pulses 16 and 20. FIG. 2A shows constantrepetition rate laser pulses 14 a-14 k that are emitted by a laser (notshown) and propagated to AOM 10. FIG. 2B demonstrates two exemplaryschemes for applying RF pulses 15 to AOM 10 to select which ones oflaser pulses 14 a-14 k, occurring at corresponding time periods 22 a-22k, are propagated toward a target. In a first scheme, a single RF pulse15 cde (shown in dashed lines) is extended to cover time periods 22 c-22e corresponding to laser pulses 14 c, 14 d, and 14 e; and, in a secondscheme, separated RF pulses 15 c, 15 d, and 15 e are generated toindividually cover the respective time periods 22 c, 22 d, and 22 e forlaser pulses 14 c, 14 d, and 14 e. FIGS. 2C and 2D show the respectivefirst order beam 20 and zero order beam 16 propagated from AOM 10, asdetermined by the presence or absence of RF pulses 15 applied to AOM 10.

Referring to FIGS. 1 and 2, AOM 10 is driven by RF driver 12. When no RFpulses 15 are applied to AOM 10, incoming laser pulses 14 pass throughAOM 10 substantially along their original beam path and exit as beam 16,typically referred to as the zero order beam 16. When RF pulses 15 areapplied to AOM 10, part of the energy of incoming laser pulses 14 isdiffracted from the path of the zero order beam 16 to a path of a firstorder beam 20. AOM 10 has a diffraction efficiency that is defined asthe ratio of the laser energy in first order beam 20 to the laser energyin incoming laser pulses 14. Either first order beam 20 or zero orderbeam 16 can be used as a working beam, depending on differentapplication considerations. For simplicity, laser pulses 14 entering AOM10 will hereafter be referred as “laser pulses” or “laser output,” andpulses delivered to the target, because they are picked by AOM 10, willbe referred to as “working laser pulses” or “working laser output.”

When the first order beam is used as the working beam, the energy of theworking laser pulses can be dynamically controlled from 100% of itsmaximum value down to substantially zero, as the RF power changes fromits maximum power to substantially zero, respectively. Because thepractical limited diffraction efficiency of an AOM 10 under an allowedmaximum RF power load is about 75% to 90%, the maximum energy value ofthe working laser pulses is about 75-90% of the laser pulse energy valuefrom the laser. However, when the zero order beam 16 is used as theworking beam, the energy of the working laser pulses can be dynamicallycontrolled from 100% of the maximum value of the laser pulse energy fromthe laser down to 15-20% of the maximum value, as the RF power changesfrom substantially zero to its maximum power, respectively. For memorylink processing, for example, when the working laser pulse is not ondemand, no leakage of system laser pulse energy is permitted, i.e., theworking laser pulse energy should be zero so the first order laser beam20 is used as the working beam.

With reference again to FIG. 2, RF pulses 15 are applied to AOM 10 atrandom time intervals and only when working laser pulses are demanded,in this case, at random integral multiples of the laser pulse interval.The random output of working laser pulses results in random variablethermal loading on AOM 10. Variable thermal loading causes geometricdistortion and temperature gradients in AOM 10, which cause gradients inits refractive index. The consequences of thermal loading distort alaser beam passing through AOM 10, resulting in deteriorated laser beamquality and instability in the laser beam path or poor beam positioningaccuracy. These distortions could be corrected to some degree if theycould be kept constant. However, when the system laser pulses aredemanded randomly, such as in laser link processing, these distortionswill have the same random nature and cannot be practically corrected.

Test results on an AOM device, such as a Model N23080-2-1.06-LTD, madeby NEOS Technologies, Melbourne, Fla., showed that with only 2 W RFpower, the laser beam pointing accuracy can deviate as much as 1 mradwhen the RF to the AOM 10 is applied on and off randomly. This deviationis a few hundred times greater than the maximum allowed for the typicalmemory link processing system. Laser beam quality distortion due to therandom thermal loading on the AOM 10 will also deteriorate thefocusability of the laser beam, resulting in a larger laser beam spotsize at the focusing point. For applications such as the memory linkprocessing that require the laser beam spot size to be as small aspossible, this distortion is very undesirable.

What is needed, therefore, is an apparatus and a method for randomlypicking working laser pulses from a high repetition rate laser pulsetrain without causing distortion to the laser beam quality andpositioning accuracy due to the random thermal loading variation on theAOM. What is also needed is an apparatus and method of generatingworking laser pulses having constant laser energy per pulse and constantpulse width on demand and/or on-the-fly at a high PRF and with highaccuracy at vastly different pulse time intervals for a variety of laserapplications such as spectroscopic, bio-tech, or micromachiningapplications, including laser link processing on memory chips.

SUMMARY OF THE INVENTION

An object of this invention is, therefore, to provide an apparatus and amethod for picking laser pulses on demand from a high repetition ratepulsed laser.

Another object of this invention is to perform such pulse picking withminimal thermal loading variation on the AOM to minimize distortion tolaser beam quality and positioning accuracy.

A further object of this invention is to provide an apparatus and amethod for generating system laser pulses on demand, having stable pulseenergies and stable pulse widths at selected wavelengths from the UV tonear IR and at high PRF's for high-accuracy laser processingapplications, such as memory link severing.

The present invention uses a laser with high repetition rate pulsedoutput in cooperation with an extra-cavity AOM device for picking orgating the laser pulses such that selected laser pulses are transmittedto the target on demand, while the rest of the laser pulses are blocked.Instead of applying the RF pulses to the AOM only when the working laserpulses are demanded as is done in the prior art, RF pulses withsubstantially similar pulse interval times, such as those of the laserpulses, are applied to the AOM regardless of whether a working laserpulse is demanded. Whenever a working laser pulse is demanded, the RFpulse is applied in coincidence with the corresponding laser pulse.Whenever a working laser pulse is not demanded, an RF pulse is alsoapplied to the AOM, but in non-coincidence with the corresponding laserpulse. The RF pulse in noncoincidence with the laser pulse preferablyhas the same RF power and duration time as does the RF pulse incoincidence with the laser pulse. The timing shifting betweennoncoincident RF pulses and the laser pulses is small enough so that thetime shifts are substantially negligible in terms of thermal loading onthe AOM. Thus, the AOM will experience substantially no thermal loadingvariation regardless of how randomly the working laser pulses aredemanded.

In a preferred embodiment, the working laser pulses are picked or gatedfrom laser pulses generated at a constant high repetition rate or at aconstant laser pulse interval. Such working laser pulses have highstability and consistency in their energy and pulse width.

Similarly, the AOM is operated at a substantially constant RF powerloading or constant thermal loading regardless of how randomly theworking laser pulses are demanded. So, there is substantially no adverseeffect on the working laser beam quality and its pointing accuracy dueto having a randomly transmissive AOM.

The RF pulse power can also be controlled to perform working laser pulseenergy control with the same AOM device to suit application needs. Toavoid an adverse effect on the working laser beam quality due to therandom variation of the RF pulse power for performing laser pulse energycontrol, the RF pulse duration can be modulated accordingly such thatthe product of the RF pulse power and the RF pulse duration remainssubstantially constant, or an additional RF pulse can be added such thatthe total RF energy applied to the AOM during one laser pulse intervalremains substantially constant.

If the workpiece processing application requires laser pulses to bedelivered at random time intervals, some action needs to be taken toensure that the energy per pulse is within the desired tolerance. Afirst preferred way of providing accurate pulse energies entails pulseperiod compensation, which includes characterizing the incomplete cavitydischarge behavior and utilizing that information for adjusting timeperiod Td to compensate for the energy errors.

A second preferred way of providing accurate pulse energies entailspulse height compensation, which employs the AOM for varying an amountof laser energy that is allowed to pass through to the workpiece.

A third preferred way of providing accurate pulse energies entails RFwindow compensation, which entails extending the Q-switch signal timeperiod to allow additional energy to be emitted from the laser cavitywhenever a dummy pulse is initiated. A ‘dummy pulse’ is referred toherein as a laser pulse emitted with the AOM blocked. The dummy pulseincludes an extended time period for discharging extra energy from thecavity such that a cavity charging time period Tc results in a pulseenergy level of the desired amount.

A fourth preferred of providing accurate pulse energies entails laserpumping compensation, which entails reducing the pumping current to thelaser prior to the emission of a working pulse. Selecting aprecharacterized pumping current based on pulse timing requirementsreduces the rate of energy buildup in the lasing medium such that theemitted real pulse has an energy level of the desired amount.

This invention is advantageous for generating stable pulse-to-pulseworking laser pulse energy for applications that ordinarily requirerandomly shutting the laser pulse on or off, including applications likeIC chip link severing. This invention is also advantageous forstabilizing the working laser pulse-to-pulse energy of a Q-switchedsolid-state laser that employs a nonlinear harmonic generation processto produce frequency-doubled, -tripled, or -quadrupled laser pulses, inwhich the working laser pulses are randomly shut on and off.

This invention is advantageous for typical AOM materials, such as fusedquartz and tellurium dioxide (TeO₂) used in the previously mentioned AOMModel N23080-2-1.06-LTD, that are quite transparent to laser wavelengthsin a broad spectral range, from the UV spectrum to near IR, such as from250 nm to 2,000 nm. In a preferred embodiment, the first order beam isemployed as the working beam; however, for some applications, if 15-10%leakage of the laser pulse energy does not cause problems, then eitherthe first order or the zero order beam can be used as the working beam.

Additional aspects and advantages of this invention will be apparentfrom the following detailed description of preferred embodiments, whichproceeds with reference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a partly schematic view of a prior art AOM device and an RFdriver, transmitting zero order and/or first order beams.

FIGS. 2A-2D are corresponding prior art timing graphs of laser pulses,RF pulses, and first and zero order AOM output laser pulses.

FIGS. 3A-3C are corresponding exemplary timing graphs of laser outputs,RF pulses, and working laser outputs as employed in a preferredembodiment.

FIGS. 4A-4C are alternative corresponding exemplary timing graphs oflaser outputs, RF pulses, and working laser outputs that demonstrate theuse of the AOM for energy control of the working laser outputs.

FIGS. 5A and 5B are alternative corresponding exemplary timing graphs ofRF pulses and working laser outputs that demonstrate the dynamic controlrange of working laser output energy afforded by the AOM.

FIGS. 6A-6C are isometric representations of exemplary memory link rowstructures with corresponding beam positions and a timing graph forshowing how working laser outputs may be randomly demanded for a linkprocessing application.

FIG. 7 is a schematic block diagram showing a preferred embodiment of anexemplary laser system employing a consistently thermally loaded AOM toprovide stable pulse-to-pulse UV laser energy on demand to processunevenly spaced links selected for removal.

FIGS. 8A and 8B are respective timing graphs of a prior art Q-switchsignal and resulting laser pulses emitted at evenly and unevenly spacedtime intervals.

FIGS. 9A and 9B are respective timing graphs of a prior art Q-switchsignal and resulting laser pulses emitted in accordance with the spacedtime intervals of FIGS. 8A and 8B, and further showing the effect ofadding a dummy pulse.

FIGS. 10A and 10B are respective timing graphs of a Q-switch signal andresulting laser pulses of this invention for emitting constant energylevel laser pulses by employing the dummy pulse of FIGS. 9A and 9B alongwith dummy pulse timing considerations of this invention.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

FIGS. 3A-3C (collectively, FIG. 3) show corresponding timing graphs oflaser outputs 24 a-24 k (collectively, laser outputs 24), occurring atcorresponding time periods 28 a-28 k, RF pulses 38 a-38 k (collectively,RF pulses 38) applied to prior art AOM 10, and working laser outputs 40a, 40 c, 40 d, 40 e, and 40 i (collectively, working laser outputs 40).In particular, FIG. 3A shows laser outputs 24 a-24 k that are emitted bya laser (not shown) at a constant repetition rate and separated bysubstantially identical laser output intervals 41. In typicalembodiments, the laser output repetition rate may range from about 1 KHzup to about 500 KHz. Exemplary laser output repetition rates range fromabout 25 KHz to greater than about 100 KHz. For link processingembodiments, each of working laser outputs 40 preferably includes asingle laser pulse having a multiple nanosecond pulse width. However,skilled persons will recognize that each of working laser outputs 40 mayinclude a burst of one or more laser pulses each having an ultrashortpulse width, such as disclosed in U.S. Pat. No. 6,574,250 for LASERSYSTEM AND METHOD FOR PROCESSING A MEMORY LINK WITH A BURST OF LASERPULSES HAVING ULTRASHORT PULSE WIDTHS, which is assigned to assignee ofthis application, or bursts of one or more pulses having pulse widthsranging from about 10 picoseconds to about 1,000 picoseconds.

FIG. 3B shows a preferred embodiment of an RF pulsing scheme 30 thatemploys RF pulses 38 separated by RF pulse intervals 43 a-43 j(generically RF pulse intervals 43) that are substantially regular oruniform to maintain variations of thermal loading on AOM 10 to within apreassigned operational tolerance. Such tolerance may be a specificthermal load window, but the preassigned tolerance may also oralternatively be windows of spot size or beam position accuracy. In oneembodiment, the thermal loading variation is maintained within 5% and/orthe beam pointing accuracy is maintained within 0.005 mrad. In apreferred embodiment, at least one RF pulse 38 is generated tocorrespond with each laser output 24.

Whenever a working laser output 40 is demanded to impinge a target suchas an electrically conductive link 60 (FIG. 6A), an RF pulse 38 isapplied to AOM 10 in coincidence with a laser output 24 such that it istransmitted through AOM 10 and becomes a working laser output 40.

In FIG. 3B, the coincident RF pulses 38 are RF pulses 38 a, 38 c, 38 d,38 e, and 38 i. FIG. 3C shows the resulting corresponding working laseroutputs 40 a, 40 c, 40 d, 40 e, and 40 i. When no working laser outputis demanded to correspond with laser outputs 24, RF pulses 38 areapplied to AOM 10 in noncoincidence with corresponding ones of laseroutputs 24. In FIG. 3B, the noncoincident RF pulses 38 are RF pulses 38b, 38 f, 38 g, 38 h, 38 j, and 38 k. FIG. 3C shows that no working laseroutputs 40 correspond with noncoincident RF pulses 38.

The noncoincident RF pulses 38 are preferably offset from theinitiations of respective laser outputs 24 by time offsets 44 that arelonger than about 0.5 microsecond. Skilled persons will appreciate thatwhile time offsets 44 are shown to follow laser outputs 24, time offsets44 could alternatively precede laser outputs 24 by a sufficient time toprevent targeting of laser working outputs 40. Thus, RF pulse intervals43 surrounding one of noncoincident RF pulses 38 may be shorter (such asRF pulse intervals 43 b and 43 h) than the overall average RF pulseinterval 43 (such as 43 c, 43 d, 43 f, 43 g, and 43 j) or longer (suchas RF pulse intervals 43 a, 43 e, and 43 i) than the average RF pulseintervals 43.

With reference again to FIG. 3C, nonimpingement intervals 46 b and 46 cbetween working laser outputs 40 c and 40 d and between working laseroutputs 40 d and 40 e, respectively, are about the same as the laseroutput interval 41. The nonimpingement intervals 46 a and 46 d betweenworking laser outputs 40 a and 40 c and between working laser outputs 40e and 40 i, respectively, are roughly integer multiples of the laseroutput interval 41 (FIG. 3A).

Skilled persons will appreciate that even though the working laseroutput 40 is preferably the first order beam 20 for most applications,such as link processing, the working laser output 40 may be the zeroorder beam 16 where leakage is tolerable and higher working laser outputpower is desirable.

In a preferred embodiment, the coincident and noncoincident RF pulses 38not only employ about the same RF energy, which is the product of an RFpower value and an RF duration, but also employ about the same RF powervalue and about the same RF duration.

FIGS. 4A-4C (collectively, FIG. 4) show corresponding timing graphs oflaser outputs 24, RF pulses 38 applied to AOM 10, and working laseroutputs 40 that demonstrate how AOM 10 can be additionally employed tocontrol the output power of working laser outputs 40. FIG. 4A isidentical to FIG. 3A and is shown for convenience only. FIGS. 4B and 4Cshow RF pulses 38′ and working laser outputs 40′, with the correspondingRF pulses 38 and working laser outputs 40 shown superimposed on them indashed lines for convenience. The energy values of working laser outputs40′ are attenuated by applying less RF power to AOM 10 for RF pulses 38′than for RF pulses 38; however, RF pulse durations 42′ are increased forRF pulses 38′ over the RF durations 42 employed for RF pulses 38 tomaintain a substantially constant product of RF power value and RFduration to maintain a substantially constant thermal loading on AOM 10.This permits on-demand selection for a continuum of output powersbetween working laser outputs 40 or 40′ without substantial variance inthermal loading on AOM 10. Skilled persons will appreciate that the RFpower values and RF durations 42 of the noncoincident RF pulses 38 canbe kept as original or can be altered to be within a specified toleranceof the RF loading variation of the coincident RF pulses 38′.

RF pulse duration 42′ is preferably selected from about one microsecondto about one-half of laser output interval 41, more preferably shorterthan 30 percent of laser output interval 41. For example, if the laserrepetition rate is 50 KHz and laser output interval 41 is 20microseconds, RF pulse duration 42′ can be anywhere between onemicrosecond and ten microseconds. The minimum RF pulse duration 42 or42′ is determined by the laser pulse jittering time and the responsetime of AOM 10. It is preferable to initiate corresponding ones of RFpulses 38 and 38′ surrounding the mid points of laser outputs 24.Likewise, it is preferable for RF pulses 38 and 38′ to be delayed oroffset about one-half of the minimum RF pulse duration from theinitiation of corresponding laser outputs 24.

FIGS. 5A and 5B (collectively, FIG. 5) show alternative correspondingtiming graphs for RF pulses 38 and working laser outputs 40 thatdemonstrate a large dynamic control range of the working laser outputenergy.

With reference to FIGS. 4A and 5, a very low energy working laser output40 a ₁ can be generated by applying an RF pulse 38 a ₁ of a near minimumof RF power sufficient to permit targeted propagation of working laseroutput 40 a ₁. An RF pulse duration 42 a ₁ coincident with laser output24 a may be kept short to minimize variations in RF pulse intervals 43,and one or more additional noncoincident RF pulses 38 a ₂ having higherRF power, but also a short RF pulse duration 42 a ₂, may be applied toAOM 10 such that the sum of the RF energy loading for RF pulses 38 a ₁and 38 a ₂ substantially equals that of RF pulse 38 b. In a preferredembodiment, the offset time 52 a between RF pulses 38 a ₁ and 38 a ₂ canbe from zero to a few microseconds. Skilled persons will appreciate thatRF pulses 38 a ₁ and 38 a ₂ can be merged into a single RF pulse 38 thatramps up the RF power after laser output 24 a is completed. Skilledpersons will also appreciate that RF pulse 38 a ₂ may precede RF pulse38 a ₁ instead of follow it. Skilled persons will appreciate that due tothe thermal inertia of AOM 10, small differences in RF interval 43 a ₁and RF intervals 43 will not cause any meaningful thermal loadingvariation from the point of view of deterioration of the laser beamquality and pointing accuracy. Accordingly, the RF interval 43 a can bekept sufficiently similar to RF intervals 43 to maintain variations inthermal loading on AOM 10 within a preassigned operational tolerance.The original noncoincident RF pulse 38 b can be maintained at itsoriginal RF pulse duration 42 b and RF power value or it can bemodulated in the same manner as the set of RF pulses 38 a ₁ and 38 a ₂.

FIGS. 6A-6C (collectively, FIG. 6) show timing graphs of the targetalignment position 70 (also scanning position 70) (FIG. 7) and theworking laser outputs 40 during an exemplary laser micromachiningprocess, such as laser processing of electrically conductive links 60a-60 k (generically links 60). FIG. 6A shows a typical link bank 62having evenly spaced links 60 that are crossed in a scan direction 54 bya targeting alignment position 70 of a beam positioning system. Based onthe results of chip testing, the positioning system is controlled totarget randomly positioned links 60 that must be severed to repair an ICdevice or other workpiece 120 (FIG. 7) while the remaining links 60remain intact. For example, the scan speed of the beam positioningsystem can be set to be constant or can be controlled and variable suchthat the target alignment position 70 crosses over each link 60 atsubstantially constant positioning intervals, and a laser 126 (FIG. 7)fires laser outputs at a substantially constant interval, which equalsthe positioning interval. Thus, with the right timing coordination,whenever position 70 crosses over a link 60, a laser output 24 (FIG. 3A)is fired. For convenience, the links 60 a, 60 c, 60 d, 60 e, and 60 iare designated for severing such that FIG. 6B, which depicts workinglaser outputs 40, can be identical to FIG. 3C. The working laser outputs40 a, 40 c, 40 d, 40 e, and 40 i, therefore, impinge links 60 a, 60 c,60 d, 60 e, and 60 i. FIG. 6C shows links 60 a, 60 c, 60 d, 60 e, and 60i after they have been severed. The laser outputs 24 are fired insynchronization with the scanning position 70 and at the same constantinterval such that each working laser output 40 would hit one link 60.Thus, with the help of the laser pulse picking or gating AOM 10,whenever a link 60 is selected for removal, AOM 10 transmits the laseroutput 24 to sever link 60 as working laser output 40. Whenever a link60 is not selected, the AOM 10 does not transmit the laser output 24 sothe link 60 remains intact. In this manner, laser 126 is running at asubstantially constant repetition rate and laser outputs 24 have asubstantially constant output interval 41, but working laser outputs 40occur at random integer multiple intervals of laser output interval 41.

FIG. 7 shows, as an example, a IC chip link severing system 110employing RF loading control on AOM 10 to provide stable pulse-to-pulseUV laser energy on demand for processing unevenly spaced links withundistorted working laser output 40. In system 110, a system controlcomputer 112 and an embedded control computer 114 co-act to control abeam position controller 116 that receives position information from anX-Y positioner 118 that positions a workpiece 120 relative to a targetalignment position 70 of a working laser output 40. Working laser output40 may propagate through various optical elements (not shown) inaddition to the fold mirror that is shown. X-Y positioner 118 may alsoinclude a Z positioner 123 that may be coupled to either the X or Ystage. X-Y positioner 118 is preferably based on a positioning systemdescribed in U.S. Pat. No. 5,751,585 for HIGH SPEED, HIGH ACCURACYMULTI-STAGE TOOL POSITIONING SYSTEM, which is assigned to the assigneeof this patent application.

In one embodiment, a UV laser subsystem 124, preferably includes aQ-switched solid state IR laser 126, such as a diode-pumped,acousto-optically Q-switched Nd:YVO₄ laser; an AOM 10 for picking orgating and amplitude modulating the laser output of IR laser 126; and afrequency multiplier 130 for converting the infrared wavelengthemissions from IR laser 126 into green and/or UV wavelengths byemploying well-known second, third, or fourth harmonic conversionprocesses. AOM 10 may be alternatively positioned after frequencymultiplier 130 as indicated by the position of an AOM 10 a (genericallyAOM 10) shown in phantom lines. In either embodiment, a laser controller134 controls the transmissivity of AOM 10 to transmit or block the laserpulses from the laser 126 to propagate working laser outputs 40 ondemand toward workpiece 120.

System control computer 112 conveys across a bus 136 into embeddedcontrol computer 114 position coordinates of workpiece 120 locationsrequiring laser processing. In a typical specimen processingapplication, workpiece 120 includes regularly spaced apart devicestructures, such as fusible links 60, only some of which requireprocessing. The locations requiring processing are referred to as targetlocations, and the locations not requiring processing are referred to asintermediate locations. Embedded control computer 114 adds to the targetlocation coordinates intermediate location coordinates that are spacedapart to trigger IR laser 126 at nearly equal intervals 41 (FIG. 4A).Embedded control computer 114 conveys the target and intermediateposition coordinates one at a time at a predetermined rate across a bus138 to registers 140 in beam position controller 116 and simultaneouslyloads control data across a bus 142 to registers 144 in laser controller134. The predetermined rate controls the movement velocity of X-Ypositioner 118, and the control data indicate whether the coordinatelocation is a target location to be processed and may further includeoutput mode, timing, and amplitude information.

Laser controller 134 operates timers 146 in either an autopulse mode ora pulse-on-target mode. In autopulse mode, timers 146 start in responseto the control data in registers 144; and, in the pulse-on-target mode,timers 146 start in response to receiving a position coincidence signal148 from a comparator 150 in beam position controller 116. Positionencoders 152 in beam position controller 116 indicate to comparator 150the current position of X-Y positioner 118, and when the currentposition matches the position coordinates stored in registers 140,position coincidence signal 148 is generated indicating that workpiece120 is properly positioned over a target position or an intermediateposition. Accordingly, if workpiece 120 is positioned over a targetposition, timers 146 simultaneously operate the Q-switch in IR laser 126and set AOM 10 to a transmissive state by applying an RF pulse 38 (FIG.4B) with predetermined RF power and RF duration 42 (FIG. 5A) to AOM 10such that a working laser output 40 passes through AOM 10 and hits thetarget link 60 (FIG. 6C). If workpiece 120 is positioned over anintermediate position, timers 146 operate the Q-switch in IR laser andapply an RF pulse 38 with predetermined RF power and RF duration 44 toAOM 10 only after a predetermined offset 44 (FIG. 3B) from the Q-switchoperation. Thus, the RF pulse 38 is in non-coincidence with laser output24 and no working laser output 40 is gated through.

Since the movement velocity of X-Y positioner 118 is preferablycontrolled such that the positioner 118 moves over the combination ofthe targets and intermediate positions at a constant rate, the laserQ-switch is fired at such a constant repetition rate, or in anotherwords, the laser output interval 41 is made substantially equal toposition move times. Therefore, the IR laser 126 is operated at asubstantially constant repetition rate, or the laser output interval 41is substantially constant so there is virtually negligible instabilitiesin laser output 24 and in laser pulse harmonic conversion due to thevariation of the laser output interval 41. Further details concerning ondemand triggering of AOM 10 can be found in U.S. Pat. No. 6,172,325 forLASER PROCESSING POWER OUTPUT STABILIZATION APPARATUS AND METHODEMPLOYING PROCESSING POSITION FEEDBACK, which is herein incorporated byreference.

The RF loading control techniques provide nearly constant thermalloading on AOM 10 by applying an RF pulse 38 to AOM 10 in coincidencewith laser output 40 when the positioner 118 is over a target or, inanother words, when a working laser output 40 is demanded, and byapplying an RF pulse 38 with the same RF energy to AOM 10 but innon-coincidence with the laser output 24 when the positioner 118 is overan intermediate position or, in another words, when a working laseroutput 40 is not demanded. Skilled persons will appreciate that withsuch substantially constant thermal loading on AOM 10, there are minimaladverse effects by AOM 10 on the quality and positioning accuracy ofworking laser output 40.

It will be further appreciated that the RF power of the RF pulse 38 onAOM 10 can be adjusted to control the energy of working laser output 40to meet target processing needs, while the RF duration 42 of the RFpulse 38 can be controlled accordingly to maintain a substantiallyconstant RF energy or arithmetic product of the RF power and the RFduration 42 of the RF pulse 38.

Not all laser processing applications are, however, suitable foroperating with a substantially constant laser PRF. As described in thebackground of the invention section, many applications require randomlytimed laser pulse emissions. Unfortunately, when randomly timed, laserssuch as IR laser 126 do not emit repeatable laser pulse energies becausethe amount of pulse energy is dependent on the elapsed time intervalsince the prior pulse.

A crude but useful analogy of pulsed laser cavity behavior is acapacitor. Energy from a power source, commonly referred to as a pump,‘charges’ the laser cavity over time. When a Q-switch signal occurs, theenergy stored in the cavity is discharged and the cavity begins tocharge again. The amount of energy delivered by the resulting laserpulse is dependent on how long the cavity is allowed to charge. If twoQ-switch signals occur within a short time period, the amount of energydelivered by the laser pulse is lower than if the two Q-switch signalsare separated by a longer time period. Therefore, without some form ofpulse energy control, pulse energy variations of 10 to 20% are possible,which is well outside the typically allowable 5% process windowvariation.

Accordingly, this invention further provides pulse energy compensationtechniques that automatically determine correction factors required forproviding predetermined laser pulse energy levels at random pulse timingintervals.

Referring again to FIG. 7, a randomly timed laser system of thisinvention may be based on IC chip link severing system 110, whichincludes Q-switched solid state IR laser 126 and AOM 10 to selectivelyblock or unblock the laser beam from reaching workpiece 120. If,however, the workpiece 120 processing application requires laser pulsesto be delivered at time intervals that are not integer multiples of auniform Q-switch signal period, some action needs to be taken to ensurethat the energy per pulse is within the desired tolerance. One solutionto this is to use one or more ‘dummy pulses’ preceding a ‘workingpulse.’ A ‘dummy pulse’ is referred to herein as a laser pulse emittedwith AOM 10 blocked, and a ‘working pulse’ is referred to herein as alaser pulse emitted with AOM 10 unblocked.

FIGS. 8A and 8B show respective timing graphs of conventional Q-switchsignal 160 and resulting laser pulses 162 emitted at evenly spaced timeintervals 1/F and an unevenly spaced time interval T. IR laser 126typically receives Q-switch pulses separated by constant time period 1/Fand emits substantially constant energy pulses 164 (either blocked orunblocked). However, IR laser 126 further receives at least one Q-switchpulse 166 separated from the previous one of laser pulses 160 by a timeperiod T that is different from, but preferably greater than 1/F, andless than 2/F for emitting a real pulse 168. Because the amount ofenergy per pulse increases as time period T between Q-switch signalsincreases, real pulse 168 has an energy level 170 that is greater thanenergy levels 172 of constant energy pulses 164.

FIGS. 9A and 9B show respective timing graphs of a prior art Q-switchsignal 180 and resulting laser pulses 182 emitted in accordance with thespaced time intervals of FIGS. 8A and 8B, and further showing the effectof adding a dummy pulse 184. Adding dummy pulse 184 at a time period 1/Fbefore real pulse 168 should cause real pulse 168 to have an energylevel 186 that is substantially the same as energy levels 172 ofconstant energy pulses 164. Ideally, dummy pulse 184 discharges theenergy in the laser cavity and allows the laser to charge back to therequired energy value in time period 1/F. Because AOM 10 blocks thelaser pulse triggered by dummy pulse 184, the laser pulse energy isprevented from reaching workpiece 120 (FIG. 7).

While suitable for some workpiece processing applications, experimentshave shown that there are secondary effects in IR laser 126 thatcontribute to pulse energy errors in real pulse 168. For example, as atime period Td between a constant energy pulse 164 and dummy pulse 184decreases, energy level 186 of real pulse 168 increases. This effectseems to occur because the energy stored in the laser cavity is notefficiently discharged when time period Td becomes smaller. Energy builtup in the cavity during time Td is only partly discharged by dummy pulse184. As the cavity then charges up in the interval between dummy pulse184 and real pulse 168, the amount of energy stored in the cavity isgreater than desired and energy level 186 of real pulse 168 is greaterthan expected.

FIGS. 10A and 10B show respective timing graphs of a Q-switch signal 190and resulting substantially constant energy level laser pulses 192 ofthis invention by employing a dummy pulse 194 having dummy pulse timingconsiderations of this invention.

A first preferred solution to the incomplete cavity discharge phenomenaentails pulse period compensation, which entails characterizing theincomplete cavity discharge behavior and utilizing that information foradjusting time period Td to compensate for the energy errors. Thispreferably employs embedded control computer 114 (FIG. 7) for collectinga data set including the relationships among a set of pulse period Tpvalues and associated sets of energy values 196 and time periods Tdassociated with generating a real pulse 198. This data set can be usedat runtime to determine the time period Td value required for initiatingdummy pulse 194 timing that generates a predetermined pulse energy value196 for each predetermined pulse period Tp value. Preferably, timeperiod Td is selected such that pulse energy value 196 substantiallyequals energy levels 172 of constant energy pulses 164.

A second preferred solution to the incomplete cavity discharge phenomenaentails pulse height compensation, which employs AOM 10 (FIG. 7) forvarying an amount of laser energy that is allowed to pass through toworkpiece 120 as described above with reference to FIGS. 4 and 5. Thispreferably entails employing embedded control computer 114 forcollecting a data set including the relationships among pulse energyvalues 196, pulse period Td, and an attenuation level of AOM 10 to setpulse energy level 196 to a predetermined value.

A third preferred solution to the incomplete cavity discharge phenomenaemploys RF window compensation, which entails providing an extended timeperiod 200 to dummy pulse 194 to allow additional energy to be emittedfrom the laser cavity whenever dummy pulse 194 is initiated. Theadditional energy is also blocked by AOM 10. Thereby, dummy pulse 194includes extended time period 200 for discharging extra energy from thecavity such that a charging time period Tc, the time period betweendummy pulse 194 and real pulse 198 results in an energy level 196 of thedesired amount, which is preferably substantially the same as energylevels 172.

A fourth preferred solution to the incomplete cavity discharge phenomenaemploys laser pumping compensation, which entails reducing the pumpingcurrent to laser 126 (FIG. 7) prior to the emission of real pulse 168(FIG. 8B or 9B) or real pulse 198 (FIG. 10B). Selecting aprecharacterized pumping current based on pulse timing requirementsreduces the rate of energy buildup in the lasing medium such that theemitted real pulse has an energy level 170, 186, or 196 of the desiredamount, which is preferably substantially the same as energy levels 172.

An advantage of the above-described techniques is that the laser-basedworkpiece processing system can automatically determine the laser pulseenergy level correction factors required based on internal system timingand laser pulse energy measurements.

Skilled workers will recognize that portions of this invention may beimplemented differently from the implementations described above forpreferred embodiments. It will be obvious to those having skill in theart that many changes may be made to the details of the above-describedembodiments without departing from the underlying principles of theinvention. The scope of the present invention should, therefore, bedetermined only by the following claims.

1. A method for delivering laser pulses to a workpiece, comprising:triggering a laser to generate a set of first consecutive laser pulseseach separated by a first time period and having a first energy level,the set of first consecutive laser pulses ending with a concluding laserpulse; triggering the laser to generate second and third laser pulsesthat are consecutive to the concluding laser pulse of the set of firstconsecutive pulses, the third laser pulse being separated from theconcluding laser pulse of the set of first consecutive laser pulses by asecond time period that is greater than the first time period, thesecond laser pulse being triggered at a predetermined time that causesthe third laser pulse to have a second energy level that issubstantially the same as the first energy level, the second laser pulsebeing separated from the concluding laser pulse by a third time periodthat is shorter than the first time period, and the third laser pulsebeing separated from the second laser pulse by a fourth time period thatis intentionally shorter that the first time period; preventing thesecond laser pulse from reaching the workpiece; and allowing the set offirst consecutive laser pulses and the third laser pulse to propagate tothe workpiece.
 2. The method of claim 1, further including: determininga relationship data set associating sets of first energy levels, secondenergy levels, and predetermined times; and selecting the predeterminedtime from the relationship data set.
 3. The method of claim 1, in whichthe allowing further includes attenuating the energy level of the thirdlaser pulse by an attenuation factor, the method further including:determining a relationship data set associating sets of second energylevels, attenuation factors, and predetermined times; and selecting fromthe relationship data set at least one of the predetermined times andattenuation factors that cause the second energy level to substantiallyequal the first energy level.
 4. The method of claim 3, in which thepreventing, attenuating, and allowing are carried out by at least one ofan acousto-optic modulator and an electro-optic modulator.
 5. The methodof claim 1, further including setting the second laser pulse to apredetermined pulse width that causes the second energy level tosubstantially equal the first energy level.
 6. The method of claim 1, inwhich the laser includes a Q-switched solid state laser.
 7. The methodof claim 1, in which the blocking and unblocking is carried out by atleast one of an acousto-optic modulator and an electro-optic modulator.8. The method of claim 1, in which the second time period is less thantwice the first time period.
 9. The method of claim 1, in which thepredetermined time is determined by at least one of a function of timefrom the set of first laser pulses and a function of time from the thirdlaser pulse.
 10. The method of claim 1, in which the workpiece includesa severable link.
 11. The method of claim 1, in which the second timeperiod is not an integer multiple of the first time period.
 12. Themethod of claim 1, in which the first laser pulses have a first energyversus time profile and the second laser pulse has a second energyversus time profile that is different from the first energy versus timeprofile.
 13. The method of claim 1, in which the second laser pulse hasa third energy level that is different from the first energy level. 14.The method of claim 1, wherein the first laser pulses are laser pulseswhose propagation to the workpiece is permitted by a gating device in anunblocking state and wherein the second laser pulse is a laser pulsewhose propagation to the workpiece is prevented by a gating device in ablocking state.
 15. The method of claim 1, in which a Q-switched laseris employed to generate the first, second, and third pulses and in whicha reduced pumping current is delivered to the Q-switched laser prior toemission of the third laser pulse.
 16. The method of claim 1, in whichpreventing the second laser pulse from reaching the workpiece includesoperating a gating device in noncoincidence with, and temporal proximityto, the second laser pulse to reduce adverse effects associated withthermal load variation on the gating device.
 17. The method of claim 1,in which the second laser pulse is separated from the set of first laserpulses by a third time period that is not an integer multiple of thefirst time period.
 18. A method for delivering laser pulses to aworkpiece, comprising: triggering a laser to generate a set of firstlaser pulses each separated by a first time period and having a firstenergy level, the set of first laser pulses ending with a concludinglaser pulse; triggering the laser to generate second and third laserpulses that are consecutive to the concluding laser pulse of the set offirst pulses, the third laser pulse being separated from the concludinglaser pulse of the set of first laser pulses by a second time periodthat is greater than the first time period, the second laser pulse beingtriggered at a predetermined time and having a predetermined pulse widththat is different from pulse widths of the first and third pulsescausing the third laser pulse to have a second energy level that issubstantially the same as the first energy level, the second laser pulsebeing separated from the concluding laser pulse by a third time periodthat is shorter than the first time period; preventing the second laserpulse from reaching the workpiece; and allowing the set of first laserpulses and the third laser pulse to propagate to the workpiece.
 19. Amethod for delivering laser pulses to a workpiece, comprising: employinga relationship data set associating sets of first energy levels of firstlaser pulses, second energy levels of third laser pulses, andpredetermined times of triggering second laser pulses with respect totriggering the third laser pulse such that the second energy level issubstantially the same as the first energy level, wherein the first,second, and third laser pulses are consecutive, wherein the first laserpulses form a set of first laser pulses each separated by a first timeperiod, wherein the set of first laser pulses ends with a concludinglaser pulse, and wherein the second laser pulse is separated from theconcluding laser pulse by a second time period that is shorter than thefirst time period; triggering a laser to generate a set of first laserpulses each separated by a first time period and having a first energylevel, the set of first laser pulses ending with a concluding laserpulse; triggering the laser to generate second and third laser pulsesthat are consecutive to the concluding laser pulse of the set of firstpulses, the third laser pulse being separated from the concluding laserpulse of the set of first laser pulses by a third time period that isgreater than the first time period, the second laser pulse beingtriggered at a predetermined time selected from the relationship dataset that causes the third laser pulse to have a second energy level thatis substantially the same as the first energy level, the second laserpulse being separated from the concluding laser pulse by a second timeperiod that is intentionally shorter than the first time period;preventing the second laser pulse from reaching the workpiece; andallowing the set of first laser pulses and the third laser pulse topropagate to the workpiece.